Evaluation of plasma parameters on PEALD deposited TaCN

In this article influence of plasma parameters on TaCN deposition using Plasma Enhanced Atomic Layer Deposition (PEALD) is studied. TaCN is deposited on 300mm Si substrate with the organometallic precursor Tertiary-ButylimidoTrisDiEthyl-aminoTantalum (TBTDET) and H"2/Ar plasma at different plasma power. Thickness, density, roughness, resistivity, crystallography and composition of the obtained layers were analysed by X-ray Reflection (XRR), 4 points probe measurement, X-ray Diffraction (XRD) and X-ray Photoelectron Spectrometry (XPS) respectively. Results show an evolution of the material with the increase of plasma power from a TaN-like to a TaC-like material.