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Selective epitaxial growth of high-P Si:P for dource/drain formation in advanced Si nFETs
Selective epitaxial growth of high-P Si:P for dource/drain formation in advanced Si nFETs
2016
Erik Rosseel
Sathish Kumar Dhayalan
Andriy Hikavyy
Roger Loo
Harald Profijt
David Kohen
S. Kubicek
T. Chiarella
Hao Yu
Naoto Horiguchi
Dan Mocuta
Kathy Barla
Aaron Thean
Greg Bartlett
Joe Margetis
Naipur Bhargava
John Tolle
Keywords:
Epitaxy
Inorganic chemistry
Materials science
Optoelectronics
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