New developments in SDS gas source technology for ion implantation
1996
The safe delivery source (SDS) technology for the low pressure storage and dispensing of arsine and phosphine to ion implanters has been successfully demonstrated in the past two years. The improved safety and productivity enhancement of the SDS has rapidly accelerated its acceptance. Since then there has been a focus to extend and refine the technology based on input from the customer base. This paper discusses improvements in the SDS technology with respect to cylinder lifetime and cylinder shelf-life. Additional data is presented on SDS release rate studies.
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