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Highly Scalable PVD/CVD-Cobalt Bilayer Salicidation Technology for sub-50nm CMOSFETs
Highly Scalable PVD/CVD-Cobalt Bilayer Salicidation Technology for sub-50nm CMOSFETs
2006
Jong-Ho Yun
Hyun-Su Kim
Sug-Woo Jung
Eun-ji Jung
Se-Hoon Kim
Byung-hee Kim
Gil-heyun Choi
Sung-tae Kim
U In Chung
Joo-Tae Moon
Keywords:
Nanotechnology
Bilayer
Cobalt
Materials science
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