Thermal management systems, arrangements and procedures for collectors grazing incidence for EUV lithography

Systems, arrangements and methods for thermal management or for thermal management of a grazing incidence collector (grazing indicence collector) (GIC) for EUV lithography applications are disclosed. The GIC thermal management assembly includes a mirror casing or GIC shawls, coupled to a sheath to form a closed or sealed chamber. An open cell heat transfer (Ocht) material is deposited in the metal chamber and is thermally and mechanically shawls and the jacket connected to the GIC mirror casing or. A coolant flows in a azimuthally symmetric manner through the Ocht material between the inlet and outlet plenums to effect cooling, when the GIC thermal management assembly is used in a GIC-mirror system that is configured to collector -EUV receive radiation from an EUV radiation source and to form.