Synthesis and characterization of sprayed nitrogen doped TiO2Thin films

Abstract Highly transparent undoped and nitrogen doped Titanium dioxide (N-TiO2) thin films were deposited onto glass/FTO substrates by chemical spray pyrolysis technique. The deposited thin films were characterized for their photoelectrochemical, structural, morphological, and optical properties using XRD, SEM, and UV–Vis spectrophotometer. X-ray diffraction studies showed that the films were polycrystalline with a tetragonal crystal structure. The scanning electron micrograph displayed that the films are uniform, compact, and with randomly distributedgrains of size varying from 40 nm to 60 nm. The observed direct bandgap was about 3.55 eV for undoped TiO2 films and 3.54 to 3.31 eV for N-TiO2 thin films.