Growth of micro- and nanocrystalline dual layer composite diamond films by microwave plasma CVD: Influence of CO2 concentration on growth of nano-layer

Abstract The high quality and smooth micro-and nanocrystalline dual layer composite diamond films were successfully prepared using H 2 /CH 4 /Ar/CO 2 plasma with a synthesis process of nucleation/MCD growth/nucleation/NCD growth. The carbon dioxide content is demonstrated to be important in controlling the NCD layer grain size and growth rate. The influences of carbon dioxide concentration on the morphology, microstructure and growth rate of the deposited NCD layer are investigated by using scanning electron microscopy (SEM), X-ray diffraction (XRD) and Raman spectroscopy. It is found that the additional carbonaceous sources supplied by CO 2 are favourable to increase the growth rate, and meanwhile, the oxygen related species generated would enhance the etching effect not only to eliminate the non-diamond phase of NCD but also to decrease the growth rate. The appropriate addition of CO 2 can increase the high quality and growth rate, decrease the surface roughness. It is demonstrated that adding CO 2 strongly affects the contents of various reaction species in plasma, which would determine the growth features of NCD layers. The deposited highly smooth and quality micro-/nano-crystal layered diamond film is also expected to be applicable in surface aroustic wave (SAW) devices and micro-electromechanical systems (MEMS).