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Plasma Etching Process Scalability and challenges for ULK Materials
Plasma Etching Process Scalability and challenges for ULK Materials
2010
Thierry Chevolleau
Nicolas Posseme
Thibaut David
R. Bouyssou
Julien Ducoté
F. Bailly
Maxime Darnon
H Chaabouni
L.L. Chapelon
M. El-kodadi
Maxime Besacier
Christophe Licitra
C. Verove
Olivier Joubert
Keywords:
Plasma etching
Scalability
Nanotechnology
Materials science
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