Social Health with a Left Ventricular Assist Device is Similar to the General Population, Regardless of Time Since Implant

Introduction Social health (i.e., ability and satisfaction with ability to participate in family, work, and leisure activities) among patients (pts) with advanced heart failure (HF) who undergo left ventricular assist device (LVAD) implantation is incompletely described. This report evaluated social health across three time periods (early, mid, and later) after implantation. Methods We evaluated data from 183 pts with LVADs who were ≤6 months, >6-24 months, and >24 months post-implant at 9 U.S. sites (10/26/16 - 12/31/18). Measures of social health included overall social health and satisfaction with social function (PROMIS v1.1) and multi-item measures of social function and satisfaction with social function (PROMIS v2.0). Tests for differences between implant groups included χ2 tests and ANOVAs. Results Pts at all 3 time periods were, on average, middle-aged; the majority were male, white, and well educated. Etiology of HF and pre-implant strategy were similar among groups. The majority of pts at all 3 time periods reported good to excellent overall ability to carry out usual social activities and roles, and satisfaction with social activities and relationships. Approximately 20% to 30% of patients in all 3 groups reported fair or poor overall social function/ability, and fair or poor satisfaction with social activities and relationships. For all 3 groups, ability to participate in social roles and activities, and satisfaction with social roles and activities approximated the U.S. general population mean of 50. Conclusions Regardless of time since implant, the majority of LVAD pts were able to participate in social activities and were satisfied with their social health. For the subset of patients who reported lower social functioning and satisfaction, future work should focus on developing effective interventions. These findings highlight the importance of assessing social health after LVAD implantation.