Structural and Microstructural Properties TiO₂ Nano-Patterns Using PDMS Replica

TiO₂ sol solution was prepared and deposited on to SiO2 buffered Si substrate. After spin coating, annealing was performed at 400℃, 500℃ and 700℃ for 1h, respectively. X-ray diffraction (XRD) investigation was carried out to examine the structural properties of TiO₂ thin films. Nanoimprint process was followed after spin coating of TiO₂ sol solution in order to form the nano-patterned TiO₂ layer. PDMS replica was fabricated from the Si based master template using nano-moulding technique. Scanning Electron Microscopy (SEM) was used to investigate the microstructural properties of TiO₂ nano-patterned layer of as-imprinted and annealed at 600℃. The phase formation of TiO₂ nano-pattern (600℃) was also measured by XRD.