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Components peripheral to the base by way of the gas flow within a chamber for chemical vapor deposition
Components peripheral to the base by way of the gas flow within a chamber for chemical vapor deposition
1997
Jun Zhao
Ashok Sinha
Avi Tepman
Mei Chang
Lee Luo
Alex Schrieber
Talex Sajoto
Stefan Wolff
Charles Dornfest
Michael Danek
Keywords:
Chemical vapor deposition
Chemical engineering
Flow (psychology)
Peripheral
Materials science
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