Old Web
English
Sign In
Acemap
>
Paper
>
Modeling of Inductively Coupled High Density Plasma Processes for the Fabrication of Semiconductor Devices
Modeling of Inductively Coupled High Density Plasma Processes for the Fabrication of Semiconductor Devices
1999
Jai Kwang Shin
Jae-joon Oh
Seong-Gu Kim
Jae Seok Huh
Hyoung In Lee
Dong-Gyu Kim
Tae Ryong Kim
Mark J Kushner
Keywords:
Semiconductor device
Plasma
Analytical chemistry
Chemistry
Nanotechnology
high density
Fabrication
Correction
Source
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]