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M. Czernohorsky
M. Czernohorsky
Fraunhofer Society
Analytical chemistry
Materials science
High-κ dielectric
Capacitor
Logic gate
4
Papers
83
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Materials for on-chip Energy Storage
2018
IEEE-NANO | International Conference on Nanotechnology
Wenke Weinreich
C. Mart
S. Zybell
S. Bonhardt
M. Czernohorsky
Kati Kühnel
A. M. Kia
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High Endurance Ferroelectric Hafnium Oxide-Based FeFET Memory Without Retention Penalty
2018
IEEE Transactions on Electron Devices
T. Ali
Patrick Polakowski
Stefan Riedel
T. Büttner
Thomas Kämpfe
Matthias Rudolph
B. Pätzold
K. Seidel
D. A. Löhr
R. Hoffmann
M. Czernohorsky
Kati Kühnel
P. Steinke
J. Calvo
K. Zimmermann
Johannes Müller
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Citations (82)
Enhanced reliability and capacitance stability of ZrO2-based decoupling capacitors by interface doping with Al2O3
2017
Microelectronic Engineering
C. Mart
S. Zybell
Stefan Riedel
M. Czernohorsky
K. Seidel
Wenke Weinreich
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High-K metal gate stacks with ultra-thin interfacial layers formed by low temperature microwave-based plasma oxidation
2017
Microelectronic Engineering
M. Czernohorsky
K. Seidel
K. Kühnel
Jürgen Niess
Nicole Sacher
Wilhelm Kegel
Wilfried Lerch
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