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Nick E. B. Cowern
Nick E. B. Cowern
Electronic engineering
Ion implantation
NMOS logic
Leakage (electronics)
Sheet resistance
2
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1
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0
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Performance Enhancements in Scaled Strained-SiGe pMOSFETs With Gate Stacks
2009
IEEE Transactions on Electron Devices
Olayiwola M. Alatise
Sarah H. Olsen
Nick E. B. Cowern
Anthony O’Neill
Prashant Majhi
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Co‐Implantation for 45 nm PMOS and NMOS Source‐Drain Extension Formation: Device Characterisation Down to 30 nm Physical Gate Length
2006
E. J. H. Collart
Bartek Pawlak
Ray Duffy
E Augendre
Simone Severi
Tom Janssens
Philippe Absil
W. Vandervorst
Susan Felch
R. Scheutelkamp
Nick E. B. Cowern
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