Old Web
English
Sign In
Acemap
>
authorDetail
>
M. Bude
M. Bude
Alcatel-Lucent
Physics
Chemical engineering
Condensed matter physics
Thin film
Leakage (electronics)
4
Papers
427
Citations
0.00
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (4)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Morphology and crystallization kinetics in HfO2 thin films grown by atomic layer deposition
2003
Journal of Applied Physics
M.-Y. Ho
Hao Gong
G. D. Wilk
B. W. Busch
Martin L. Green
Paul M. Voyles
David A. Muller
M. Bude
Wen He Lin
Alex See
M. E. Loomans
S K Lahiri
Petri Raisanen
Show All
Source
Cite
Save
Citations (149)
Nucleation and growth of atomic layer deposited HfO2 gate dielectric layers on chemical oxide (Si-O-H) and thermal oxide (SiO2 or Si-O-N) underlayers
2002
Journal of Applied Physics
Martin L. Green
M.Y Ho
B. W. Busch
G. D. Wilk
T. W. Sorsch
Thierry Conard
Bert Brijs
Wilfried Vandervorst
Petri Raisanen
David A. Muller
M. Bude
John Grazul
Show All
Source
Cite
Save
Citations (248)
Enabling shallow trench isolation for 0.1 /spl mu/m technologies and beyond
1999
VLSIT | Symposium on VLSI Technology
C.P. Chang
S.F. Shive
S. Kuehne
Yi Ma
H.-H. Vuong
F.H. Baumann
M. Bude
E.J. Lloyd
C.S. Pai
Mahjoub A. Abdelgadir
R. Dail
C.T. Liu
K.P. Cheung
J.I. Colonell
W.Y.C. Lai
J.F. Miner
H. Vaidya
R. Liu
J. T. Clemens
Show All
Source
Cite
Save
Citations (4)
A highly manufacturable corner rounding solution for 0.18 /spl mu/m shallow trench isolation
1997
IEDM | International Electron Devices Meeting
C.P. Chang
C.S. Pai
F.H. Baumann
C. T. Liu
C. S. Rafferty
M.R. Pinto
E.J. Lloyd
M. Bude
F. Klemens
J.F. Miner
K.P. Cheung
J.I. Colonell
W.Y.C. Lai
H. Vaidya
S.J. Hillenius
R. Liu
J.T. Clemens
Show All
Source
Cite
Save
Citations (26)
1