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R. Ogura
R. Ogura
Renesas Electronics
High-κ dielectric
Trapping
Non-volatile memory
Thermal oxidation
Optoelectronics
2
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Fabrication and Evaluation of Split-Gate Type Charge-Trapping Nonvolatile Memory with High-k Trapping and Blocking Layers for Embedded Flash
2021
IWJT | International Workshop on Junction Technology
Y. Z. Wang
A. Amo
E. Tsukuda
Kenichiro Sonoda
R. Ogura
S. Kimura
Tomoya Saito
Tadashi Yamaguchi
T. Mihara
Masao Inoue
T. Ogata
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Sub-6V Operation of Split-Gate Type Charge-Trapping Nonvolatile Memory with High-k Trapping and Blocking Layers for High-Speed and HighlyReliable Embedded Flash
2020
IMW | International Memory Workshop
Y. Z. Wang
A. Amo
Keiichi Maekawa
K. Uchimura
K. Sonoda
R. Ogura
S. Kimura
Tomoya Saito
T. Maruyama
Masao Inoue
Hiroshi Yanagita
Tomohiro Yamashita
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