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X. Tang
X. Tang
Applied Materials
Optoelectronics
Metal gate
Metrology
Wafer
Electronic engineering
3
Papers
9
Citations
0
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2024
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Enabling STT-MRAM in High Volume Manufacturing for LLC Applications
2019
IMW | International Memory Workshop
R. Whig
C. Ching
X. Wang
P. Agrawal
D. Kim
R. Wang
J. Lei
R. Zheng
Lin Xue
Jaesoo Ahn
H. Tseng
S. Kumar
W. Zhou
E. Budiarto
T. Egan
S. Venkatanarayanan
N. Khasgiwale
W. Chen
C. Zhou
Mahendra Pakala
K. Moraes
X. Tang
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Highly conductive metal gate fill integration solution for extremely scaled RMG stack for 5 nm & beyond
2017
IEDM | International Electron Devices Meeting
N. Yoshida
Sajjad Hassan
W. Tang
Yixiong Yang
W. Zhang
S. C. Chen
L. Dong
Hongwen Zhou
Miao Jin
Motoya Okazaki
J. Park
N. Bekiaris
Raymond Hung
Jie Zhou
Y. Lei
P. Ma
X. Tang
T. Miyashita
Nam Sung Kim
E. Yieh
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Citations (8)
Ultra‐thin AlOx and LaOx Metrology—WD‐XRF Technique Development
2009
C. C. Wang
R. Wang
D. Liu
Y. Cao
X. Tang
Y. Uritsky
S. Gandikota
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Citations (1)
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