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Yixiong Yang
Yixiong Yang
Applied Materials
Metal gate
Physics
CMOS
Optoelectronics
Electronic engineering
2
Papers
12
Citations
0
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Novel Materials and Processes in Replacement Metal Gate for Advanced CMOS Technology
2018
IEDM | International Electron Devices Meeting
Ruqiang Bao
Steven Hung
Miaomiao Wang
Kisup Chung
Soumendra Narayan Barman
Siddarth A Krishnan
Yixiong Yang
Wei Tang
Luping Li
Yongjing Lin
Michael S Chan
Zhebo Chen
Xin Miao
Marinus Hopstaken
Richard A. Conti
Hemanth Jagannathan
M. Chudzik
Dalea McHerron
Bala Haran
Sanjay Natarajan
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Citations (4)
Highly conductive metal gate fill integration solution for extremely scaled RMG stack for 5 nm & beyond
2017
IEDM | International Electron Devices Meeting
N. Yoshida
Sajjad Hassan
W. Tang
Yixiong Yang
W. Zhang
S. C. Chen
L. Dong
Hongwen Zhou
Miao Jin
Motoya Okazaki
J. Park
N. Bekiaris
Raymond Hung
Jie Zhou
Y. Lei
P. Ma
X. Tang
T. Miyashita
Nam Sung Kim
E. Yieh
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Citations (8)
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