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Felix Wahlisch
Felix Wahlisch
ASML Holding
Extreme ultraviolet lithography
Materials science
Optics
Critical dimension
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5
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4
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0
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Impact of local variability on defect-aware process windows
2019
Mark Maslow
Hidetami Yaegashi
Andreas Frommhold
Guido Schiffelers
Felix Wahlisch
Gijsbert Rispens
Bram Slachter
Keisuke Yoshida
Arisa Hara
Noriaki Oikawa
Abhinav Pathak
Dorin Cerbu
Eric Hendrickx
Joost Bekaert
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Citations (2)
Particle on EUV pellicles, impact on LWR
2019
Michiel Kupers
Gijsbert Rispens
Lokesh Devaraj
Gerardo Bottiglieri
Twan van den Hoogenhoff
Par Broman
Andreas Erdmann
Felix Wahlisch
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Improving exposure latitudes and aligning best focus through pitch by curing M3D phase effects with controlled aberrations
2019
Joern-Holger Franke
Joost Bekaert
Victor M. Blanco Carballo
Lieve Van Look
Felix Wahlisch
Kateryna Lyakhova
Paul van Adrichem
Mark John Maslow
Guido Schiffelers
Eric Hendrickx
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Lithographic effects due to particles on high-NA EUV mask pellicle
2019
Lokesh Devaraj
Gerardo Bottiglieri
Andreas Erdmann
Felix Wahlisch
Michiel Kupers
Eelco van Setten
Timon Fliervoet
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Progress in imaging performance with EUV pellicles
2019
O. Romanets
K. Ricken
Michiel Kupers
Felix Wahlisch
C. Piliego
Par Broman
D. de Graaf
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