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Shihsheng Chang
Shihsheng Chang
Materials science
Nanotechnology
Thin film
Chemical engineering
Metalorganic vapour phase epitaxy
2
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1
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Plasma etch selectivity study and material screening for self-aligned gate contact (SAGC)
2019
Dunja Radisic
Marc Demand
Shihsheng Chang
S. Demuynck
Kaushik A. Kumar
Andrew Metz
Lieve Teugels
Junling Sun
Jeffrey T. Smith
Farid Sebaai
Toby Hopf
Efrain Altamirano Sanchez
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Growth and characterization of nanowires and nanorods on Al 2 O 3 (110), Si(111) and SiO 2 /p-Si(100) by MOCVD
2011
ISDRS | International Semiconductor Device Research Symposium
Abdiel Rivera
Mehdi Anwar
Mathiey R. Monville
Shihsheng Chang
John W. Zeller
Ashok K. Sood
Tariq Manzur
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