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Kenji Masui
Kenji Masui
Toshiba
Photomask
Materials science
Engineering
Process engineering
Mercury (element)
5
Papers
3
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0
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2024
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Fabrication of Ta based absorber EUV mask with SRAF
2018
Keiko Morishita
Kosuke Takai
Kenji Masui
Takashi Kamo
Tsukasa Abe
Yasutaka Morikawa
Naoya Hayashi
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Application of two-fluid nozzles for advanced photomask cleaning process
2008
Kenji Masui
Tetsuo Takemoto
Kyo Otsubo
Mari Sakai
Tomotaka Higaki
Hidehiro Watanabe
Tsutomu Kikuchi
Yoshiaki Kurokawa
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Mask cleaner innovation
2000
Hidehiro Watanabe
Kenji Masui
Akio Kosaka
Naoya Hayamizu
Akinori Iso
Hachiro Hiratsuka
Yoshiaki Minegishi
Fumiaki Shigemitsu
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Ultra-fine mask cleaning technology using ultra-violet irradiation
1998
Kenji Masui
Akio Kosaka
Hiroishi Fujita
Hidehiro Watanabe
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Ultrafine mask cleaning technology using ultraviolet irradiation
1998
Kenji Masui
Akio Kosaka
Hiroishi Fujita
Hidehiro Watanabe
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Citations (1)
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