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Ben Eynon
Ben Eynon
KLA-Tencor
Real-time computing
Photolithography
Engineering
Lithography
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2
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5
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Process window impact of progressive mask defects, its inspection and disposition techniques (go / no-go criteria) via a lithographic detector
2005
Jerry Huang
Lan-Hsin Peng
Chih Wei Chu
Kaustuve Bhattacharyya
Ben Eynon
Farzin Mirzaagha
Tony DiBiase
Kong Son
Jackie Cheng
Ellison Chen
Den Wang
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Citations (5)
A reticle quality management strategy in wafer fabs addressing progressive mask defect growth problem at low k1 lithography
2004
Advanced Semiconductor Manufacturing Conference
Kaustuve Bhattacharyya
Kong Son
Ben Eynon
D. Gudmundsson
Carmen Jaehnert
Doris Uhlig
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