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Michael Telgenhoff
Michael Telgenhoff
Dow Chemical Company
Silicon nitride
Hexachlorodisilane
Atomic layer deposition
Plasma
Materials science
2
Papers
19
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Investigation of the Physical Properties of Plasma Enhanced Atomic Layer Deposited Silicon Nitride as Etch Stopper
2018
ACS Applied Materials & Interfaces
Harrison Sejoon Kim
Xin Meng
Si Joon Kim
Antonio T. Lucero
Lanxia Cheng
Young-Chul Byun
Joy S. Lee
Su Min Hwang
Aswin L. N. Kondusamy
Robert M. Wallace
Gary Goodman
Alan S. Wan
Michael Telgenhoff
Byung Keun Hwang
Jiyoung Kim
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Citations (8)
Hollow Cathode Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using Pentachlorodisilane
2018
ACS Applied Materials & Interfaces
Xin Meng
Harrison Sejoon Kim
Antonio T. Lucero
Su Min Hwang
Joy S. Lee
Young-Chul Byun
Jiyoung Kim
Byung Keun Hwang
Xiaobing Zhou
Jeanette Young
Michael Telgenhoff
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Citations (11)
1