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Xiaobing Zhou
Xiaobing Zhou
Dow Chemical Company
Materials science
Inorganic chemistry
Chemistry
Hexachlorodisilane
Silicon nitride
4
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17
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Hollow Cathode Plasma (HCP) Enhanced Atomic Layer Deposition of Silicon Nitride (SiNx) Thin Films Using Pentachlorodisilane (PCDS)
2019
Su Min Hwang
Aswin L. N. Kondusamy
Zhiyang Qin
Harrison Sejoon Kim
Xin Meng
Jiyoung Kim
Byung Keun Hwang
Xiaobing Zhou
Telgenhoff Michael D
Jeanette Young
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Citations (2)
Hollow Cathode Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using Pentachlorodisilane
2018
ACS Applied Materials & Interfaces
Xin Meng
Harrison Sejoon Kim
Antonio T. Lucero
Su Min Hwang
Joy S. Lee
Young-Chul Byun
Jiyoung Kim
Byung Keun Hwang
Xiaobing Zhou
Jeanette Young
Michael Telgenhoff
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Citations (11)
Study on the Shock Sensitivity of the Hydrolysis Products of Hexachlorodisilane
2018
Industrial & Engineering Chemistry Research
Xiaobing Zhou
Mark A. Wanous
Xianghuai Wang
Donald V. Eldred
Thomas L. Sanders
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Citations (4)
Résines de polysilanesiloxane pour utilisation dans un revêtement antireflet
2012
Xiaobing Zhou
Eric S. Moyer
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