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Nancy Zhang
Nancy Zhang
Mattson Technology, Inc.
Plasma
Analytical chemistry
Materials science
Optoelectronics
Substrate (chemistry)
3
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Study of downstream CF 4 contained plasma process impact on chamber condition
2018
CSTIC | China Semiconductor Technology International Conference
Yali Fu
Shawming Ma
Yi Wang
Ken Wang
Mingjie Jiao
Nancy Zhang
Vijay Vaniapura
HaiAu PhanVu
Bob Elliston
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Study of Plug Etch back process matching on faraday shielded ICP and traditional CCP plasma ETCH chambers
2018
CSTIC | China Semiconductor Technology International Conference
Yali Fu
Shawming Ma
Yi Wang
Jammy Xiao
M H Kim
Nancy Zhang
Mingjie Jiao
Frank Wang
Tammy Lee
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Defect Free HDIS Process for Sub 28nm HKMG Using Reducing Chemistry
2014
Li Diao
Xiaoying Meng
Qiuhua Han
Haiyang Zhang
Robert George Elliston
HaiAu PhanVu
Vijay Vaniapura
Nancy Zhang
Keith Zhou
Christopher Lee
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