Higher current density operation with EB reticle writer EBM-5000

The performance of electron beam reticle writer EBM-5000(NFT) was examined with higher current density. The current density was raised up to 70A/cm 2 against to its standard current density 50A/cm 2 , and sufficiently good results were obtained with that operating condition. We concluded that the performance with that operating condition was good enough to produce photomasks for 65nm node devices.