Thermal management systems and arrangements for grazing incidence collectors for EUV lithography and EUV lithography system

Thermal management arrangement for a grazing incidence collector (GIC) corresponding to the flow of a coolant (172) is used, comprising: GIC mirror shell (110) with a reflective inner surface (116), an opposite outer surface (118) and first and second mirror member (170T, 170L); a jacket (160) having an inner surface and first and second envelope ends, wherein the sheath (160) and the GIC mirror shell comprise first and second contact surfaces on the respective first and second mirror and sheath ends (110) to a fluid-tight chamber ( to define 180) between the inner surface of the shell (160) and the outer surface of the GIC mirror shell (110), wherein the sealed chamber (180) having inlet and outlet ends (201L, 201T), each of entry and exit defining distribution channels (230L, 230T), each having inlet and outlet openings (169L, 169T); and an open-celled heat-transfer (Ocht) material (202) contained in the sealed chamber (180) which is thermally connected to the outer surface of the GIC mirror shell (110) and the inner surface of the shell (160), said Ocht material serves the flow of the coolant (172) therethrough from the inlet manifold passage (230L) to the outlet manifold channel (230T) support.