A New Retention Method for Sub-10 nm Liquid Filtration Using Fluorescent CdSe QDs

As advances are made in the lithographic patterning process and critical defect size continues to shrink, new filters are required to remove particles in the sub-10 nm size range. Membrane filtration separates unwanted particles from a fluid by retaining particles on the membrane surface and pores, in much the same manner as a sieve. One key parameter of membrane performance is pore size, usually expressed as pore diameter. However, for nanofiltration, especially for the membranes whose pore size measures under 30 nm, manufacturers may use different methods to rate the membranes pore. Considering the different chemical structures of membranes, the vast combination of materials, and the methods of manufacturing, it is highly unlikely that a universal method can be used for all combinations.