Development of a Controlled in Situ Process for the Formation of Porous Anodic Alumina and Al Nanomesh From Thin Aluminum Films

This work is devoted to the development and study of in situ controlled process of the formation of porous anodic alumina and Al nanomesh from thin aluminum films deposited by a direct current magnetron on glass substrates with an adhesive layer of Nb. In order to control in situ anodic oxidation processes during the formation of the structure of PAA-Al nanomesh and the removal of PAA by etching, the method of monitoring of an angular reflection curve was applied. The obtained Al nanomesh was studied by the SEM method. Particular attention is paid to the connection between the features of the initial thin-film structures and the formed Al nanomesh.