High-end EUV photomask repairs for 5nm technology and beyond

Scaling trends in the semiconductor industry towards smaller technology nodes and features sizes are continuing and first consumer products manufactured with the help of EUV technology are already on the market. In this paper we present our latest results of high-end EUV repairs carried out on the next generation photomask repair tool MeRiT® LE. The tool shows improved system dynamics, makes use of a new electron beam column, which operates at a low electron beam voltage down to 400V and enables the repair of next generation ultra-small defects.