Old Web
English
Sign In
Acemap
>
authorDetail
>
Hubertus Marbach
Hubertus Marbach
Carl Zeiss AG
Materials science
Extreme ultraviolet lithography
Engineering physics
Photomask
Voltage
2
Papers
0
Citations
0
KQI
Citation Trend
Filter By
Interval:
1900~2024
1900
2024
Author
Papers (2)
Sort By
Default
Most Recent
Most Early
Most Citation
No data
Journal
Conference
Others
Pushing the limits of EUV mask repair: addressing sub-10 nm defects with the next generation e-beam-based mask repair tool
2021
Tilmann Heil
Michael Waldow
Renzo Capelli
Horst Schneider
Laura Ahmels
Fan Tu
Johannes Schöneberg
Hubertus Marbach
Show All
Source
Cite
Save
Citations (0)
High-end EUV photomask repairs for 5nm technology and beyond
2020
Michael Waldow
Horst Schneider
Fan Tu
Bartholomaeus Szafranek
Katharina Gries
Daniel Rhinow
Sebastian Vollmar
Andreas Krugmann
Ralf Schoenberger
Walter Pauls
Andreas Verch
Renzo Capelli
Alice D. Vincenzo
Grizelda Kersteen
Hubertus Marbach
Show All
Source
Cite
Save
Citations (0)
1