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Bartholomaeus Szafranek
Bartholomaeus Szafranek
Carl Zeiss AG
Photomask
Extreme ultraviolet lithography
Reliability engineering
Autoanalysis
Turnaround time
2
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2024
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High-end EUV photomask repairs for 5nm technology and beyond
2020
Michael Waldow
Horst Schneider
Fan Tu
Bartholomaeus Szafranek
Katharina Gries
Daniel Rhinow
Sebastian Vollmar
Andreas Krugmann
Ralf Schoenberger
Walter Pauls
Andreas Verch
Renzo Capelli
Alice D. Vincenzo
Grizelda Kersteen
Hubertus Marbach
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SEM AutoAnalysis for reduced turnaround time and to ensure repair quality of EUV photomasks
2019
Kokila D. Egodage
Fan Tu
Horst Schneider
Christian F. Hermanns
Grizelda Kersteen
Bartholomaeus Szafranek
Kristian Schulz
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