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Fan Tu
Fan Tu
Carl Zeiss AG
Extreme ultraviolet lithography
Photomask
Materials science
Reliability engineering
Autoanalysis
3
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2024
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Pushing the limits of EUV mask repair: addressing sub-10 nm defects with the next generation e-beam-based mask repair tool
2021
Tilmann Heil
Michael Waldow
Renzo Capelli
Horst Schneider
Laura Ahmels
Fan Tu
Johannes Schöneberg
Hubertus Marbach
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High-end EUV photomask repairs for 5nm technology and beyond
2020
Michael Waldow
Horst Schneider
Fan Tu
Bartholomaeus Szafranek
Katharina Gries
Daniel Rhinow
Sebastian Vollmar
Andreas Krugmann
Ralf Schoenberger
Walter Pauls
Andreas Verch
Renzo Capelli
Alice D. Vincenzo
Grizelda Kersteen
Hubertus Marbach
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SEM AutoAnalysis for reduced turnaround time and to ensure repair quality of EUV photomasks
2019
Kokila D. Egodage
Fan Tu
Horst Schneider
Christian F. Hermanns
Grizelda Kersteen
Bartholomaeus Szafranek
Kristian Schulz
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