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Van Le
Van Le
Ultratech, Inc.
Annealing (metallurgy)
Wafer
Metallurgy
Nickel
Leakage (electronics)
4
Papers
12
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Process optimization to reduce NiSi pipes and NiSi agglomeration on 28nm Nickel silicide LSA ms anneal process
2015
VLSI-TSA | International Symposium on VLSI Technology, Systems, and Applications
Varadharajan Vijayaragavan
Clemens Fitz
Marco Lepper
Ralf Reisdorf
Holub Jan
Van Le
Jim Willis
Yun Wang
Michael Awdshiew
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Laser spike annealing for nickel silicide formation
2011
ASMC | Advanced Semiconductor Manufacturing Conference
Jeffrey Hebb
Yun Wang
Shrinivas Shetty
Jim McWhirter
David M. Owen
Michael Shen
Van Le
Jeffrey Mileham
David Gaines
Serguei Anikitchev
Shaoyin Chen
Paul M. Bischoff
Joe Lee
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Characterization of nickel silicide transition behavior using non-contact CGS metrology
2010
RTP | International Conference on Advanced Thermal Processing of Semiconductors
David M. Owen
Jeff Hebb
Shrinivas Shetty
Yun Wang
Van Le
Robert Binder
Rainer Giedigkeit
Stephan Waidmann
Inka Richter
Kornelia Dittmar
Hartmut Prinz
M. Weisheit
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Citations (2)
Impact of dual beam laser spike annealing parameters on nickel silicide formation characteristics
2010
RTP | International Conference on Advanced Thermal Processing of Semiconductors
Jeffrey Mileham
Van Le
Shrinivas Shetty
Jeff Hebb
Yun Wang
Dave Owen
Robert Binder
Rainer Giedigkeit
Stephan Waidmann
Inka Richter
Kornelia Dittmar
Hartmut Prinz
M. Weisheit
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Citations (3)
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